Nonstoichiometric silica mask for fabricating reverse proton-exchanged waveguides in lithium niobate crystals

Applied Optics

Volumn 43, Issue 4, 2004, Pages 940-943

  Parisi, Antonio ^a   Cino, Alfonso C ^a   Busacca, Alessandro C ^b   Riva Sanseverino, Stefano ^b  

^a Laboratorio Optoelettronica   (Italy)

^b UNIVERSITY OF PALERMO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; DEPOSITION; DRY ETCHING; ELECTRIC FIELDS; LITHIUM NIOBATE; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PROTONS; SILICA;

ELECTRIC FIELD POLING; ION PLATING PLASMA ASSISTED DEPOSITION; LITHIUM NIOBATE CRYSTAL; METAL FILM; SILICA MASK;

MASKS;

EID: 1142279530     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.43.000940     Document Type: Article

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