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Journal of Applied Physics

Volumn 72, Issue 1, 1992, Pages 43-53

Deposition mechanism of hydrogenated hard-carbon films in a CH4 rf discharge plasma

(3) Mutsukura, Nobuki a Inoue, Shin Ichi a Machi, Yoshio a

a TOKYO DENKI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11344277892 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.352145 Document Type: Article

Times cited : (162)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.