Inherent surface roughening as a limiting factor in epitaxial cluster deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 228, Issue 1-4 SPEC. ISS., 2005, Pages 69-74

  Meinander, K ^a   Nordlund, K ^a   Keinonen, J ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Clusters; Deposition process; Epitaxy; Molecular dynamics

Indexed keywords

CLUSTERS; DEPOSITION PROCESS; EPITAXIAL CLUSTER DEPOSITION; THERMAL ENERGIES;

COMPUTER SIMULATION; DEPOSITION; EPITAXIAL GROWTH; GRAIN SIZE AND SHAPE; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; SUBSTRATES; THERMAL EFFECTS;

SURFACE ROUGHNESS;

EID: 11344253059     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.10.025     Document Type: Conference Paper

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