A study of high-temperature implantation of 72 keV copper ions into nickel

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 228, Issue 1-4 SPEC. ISS., 2005, Pages 151-155

  Tsai, Wen Fa ^a,b   Liang, J H ^a   Kai, J J ^a   Kulcinski, G L ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

^c University of Wisconsin Madison   (United States)

Author keywords

Accelerator; Ion implantation; Point defects; Radiation effects

Indexed keywords

HIGH-TEMPERATURE IMPLANTATION; HIGH-TEMPERATURE ION IMPLANTATION; RADIATION ENHANCED DIFFUSION (RED); RADIATION INDUCED SEGREGATION (RIS);

COPPER; CRYSTAL LATTICES; HIGH TEMPERATURE EFFECTS; POINT DEFECTS; RADIATION EFFECTS; SEGREGATION (METALLOGRAPHY); SPUTTERING; THERMAL EFFECTS;

ION IMPLANTATION;

EID: 11344249942     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.10.038     Document Type: Conference Paper

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