Multilayer photoimageable thick-films in microwave frequencies

15th International Conference on Microwaves, Radar and Wireless Communications, MIKON - 2004

Volumn 1, Issue , 2004, Pages 122-127

  Dziurdzia, Barbara ^a   Kral, Jerzy ^a   Magoński, Zbigniew ^a   Ciez, Michał ^b   Gregorczyk, Wojciech ^c  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^b Research Group of Integrated Circuits and System Design   (Poland)

^c TELECOMMUNICATIONS RESEARCH INSTITUTE   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

MICROWAVE FREQUENCIES; PHOTOIMAGEABLE THICK FILM TECHNOLOGY; PHOTOMASKS; THIN FILM CONDUCTORS;

ACRYLIC MONOMERS; CAPACITANCE; DIELECTRIC MATERIALS; ETCHING; LIGHT ABSORPTION; MICROWAVE CIRCUITS; MULTILAYERS; PHOTOSENSITIVITY; POLYMERIZATION; SCREEN PRINTING; ULTRAVIOLET RADIATION; WIRELESS TELECOMMUNICATION SYSTEMS;

THICK FILMS;

CAPACITANCE; MICROWAVES; MULTILAYERS; PHOTOSENSITIVITY;

EID: 11244354799     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. Du Pont Data Sheets 2001
2. Tredinnick M., Barnwell P., Malanga D., "Thick-film Fine Line Patterning - A Definite Discussion of the Alternatives", 2001 International Symposium on Microelectronics, Baltimore, USA, Oct. 9-11, 2001, p.679-681.
3. th IMAPS Nordic Conference, Oslo,2001,p.84-88.