Midgap photon effects in As2S3 glass

Philosophical Magazine Letters

Volumn 84, Issue 9, 2004, Pages 601-606

  Tanaka, Keijl ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; GLASS; LIGHT ABSORPTION; PHOTONS; REFRACTIVE INDEX; SILICA;

MIDGAP PHOTONS; PHOTON ENERGY; TWO-PHOTON EXCITATION;

ARSENIC COMPOUNDS;

EID: 11244283239     PISSN: 09500839     EISSN: None     Source Type: Journal    
DOI: 10.1080/09500830412331314850     Document Type: Article

References (31)

1. ALEKSANDROV, A. P., BABIN, A. A., KISELEV, A. M., KULAGIN, D. I., LOZHKAREV, V. V., and STEPANOV, A. N., 2001, Quant. Electron., 31, 398.
2. ASOBE, M., KANAMORI, T., NAGANUMA, K., ITOH, H., and KAINO, T., 1995, J. appl. Phys., 77, 5518.
3. AWAZU, K., 2000, Appl. Surf. Sci., 168, 92.
4. BELYKH, A. V., EFIMOV, O. M., GLEBOV, L. B., MATVEEV, YU. A., MEKRYUKOV, A. M., MIKHAILOV, M. D., and RICHARDSON, K., 1997, J. non-crystalline Solids, 213/214, 330.
5. BORISOVA, Z. U., 1981, Glassy Semiconductors (New York: Plenum), p. 137.
6. CHUMASH, V., COJOCARU, I., FAZIO, E., MICHELOTTI, F., and BERTOLOTTI, M., 1996, Progress in Optics, Vol. XXXVI, edited by E. Wolf (Amsterdam: Elsevier), p. 1.
7. EFIMOV, O. M., GLEBOV, L. B., RICHARDSON, K. A., VAN STRYLAND, E., CARDINAL, T., PARK, S. H., COUZI, M., and BRUNÉEL, J. L., 2001, Opt. Mater., 17, 379.
8. ENCK, R. C., 1973, Phys. Rev. Lett., 31, 220.
9. FRUMAR, M., FIRTH, A. P., and OWEN, A. E., 1984, Phil. Mag. B, 50, 463.
10. FRUMAR, M., FRUMAROV́, B., WÁGNER, T., and NÈMEC, P., 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 2.
11. GALKIEWICZ, R. K., and TAUC, J., 1972, Solid St. Commun., 10, 1261.
12. HÔ, N., LANIEL, J. M., VALLÉE, R., and VILLENEUVE, A., 2003, Opt. Lett., 28, 965.
13. IKUTA, Y., KIKUGAWA, S., HIRANO, M., and HOSONO, H., 2000, J. vac. Sci. Technol. B, 18, 2891.
14. KOBLISKA, R. J., and SOLIN, S. A., 1973, Phys. Rev. B, 8, 756.
15. KOLOBOV, A. V., 2003, Photo-induced Metastability in Amorphous Semiconductors (Weinheim: Wiley-VCH).
16. KOSEK, F., CHLEBNY, J., CIMPLE, Z., and MAŠEK, J., 1983, Phil. Mag. B, 47, 627.
17. LEŽAL, D., KON̄ÁK, K., POLÁKOVÁ, S., and PETROVSKÁ, B., 1993, J. non-crystalline Solids, 161, 301.
18. MENEGHINI, C., and VILLENEUVE, A., 1998, J. opt. Soc. Am. B, 15, 2946.
19. 2 and Related Dielectrics: Science and Technology (Dordrecht: Kluwer Academic).
20. POLLARD, W. B., and JOANNOPOULOS, J. D., 1978, Phys. Rev. B, 17, 1778.
21. TAKAHASHI, M., UCHINO, T., and YOKO, T., 2002, J. Am. Ceram. Soc., 85, 1089.
22. TAKIGAWA, Y., KUROSAWA, K., SASAKI, W., YOSHIDA, K., FUJIWARA, E., and KATO, Y., 1990, J. non-crystalline Solids, 116, 293.
23. TANAKA, K., 1980a, J. non-crystalline Solids, 35/36, 1027.
24. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
25. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
26. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
27. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
28. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
29. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
30. TANAKA, K., 1980b, Solid St. Commun., 34, 201; 1986, Jap. J. Appl. Phys., 25, 779; 1987, Phys. Rev. B, 36, 9746; 1988, Thin Solid Films, 157, 35; 1999, Phil. Mag. Lett., 79, 25; 2002, Appl. Phys. Lett., 80, 177; 2003, Photo-induced Metastability in Amorphous Semiconductors, edited by A. V. Kolobov (Weinheim: Wiley-VCH), chapter 5.
31. TANAKA, K., GOTOH, T., YOSHIDA, N., and NONOMURA, S., 2002, J. appl. Phys., 91, 125.