Next-generation abrasive particles for CMP

Solid State Technology

Volumn 47, Issue 12, 2004, Pages

  Parker, John ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVE PARTICLES; GAS-PHASE DECOMPOSITION; SOLID PARTICLES; VAPOR-PHASE METHODS;

AGGLOMERATION; DECOMPOSITION; HYDROCHLORIC ACID; HYDROLYSIS; INTEGRATED CIRCUITS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; POLISHING; SILICON WAFERS; SLURRIES; SOLUTIONS;

ABRASIVES;

EID: 11144328054     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (2)

1. A.S. Edelstein, R.C. Cammarata, Nanomaterials: Synthesis, Properties, and Applications, Institute of Physics Publishing, Philadelphia, 1996.
2. K.J. Klabunde, Nanoscale Materials in Chemistry, J. Wiley, New York, 2001.