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Volumn 37-38, Issue , 1997, Pages 329-334

Planar aluminum interconnection formed by electrochemical anodizing technique

Author keywords

Aluminium; Anodic alumina; Electrochemical anodizing; Multilevel interconnection; Planarization; ULSI

Indexed keywords

ALUMINA; ALUMINUM; ANODIC OXIDATION; DIELECTRIC FILMS; INTEGRATED CIRCUIT MANUFACTURE; ULSI CIRCUITS;

EID: 10944248891     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(97)00129-9     Document Type: Article
Times cited : (37)

References (11)
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  • 2
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  • 4
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  • 5
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    • Aluminium interconnections of VLSI planarized by electrochemical anodizing
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  • 10
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    • Planarized thin film inductors and capacitors for hybrid integrated circuits made of aluminum and anodic alumina
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.