VOx thin films obtained by ion beam sputtering and oxidation process

Surface and Coatings Technology

Volumn 191, Issue 2-3, 2005, Pages 330-334

  Wang, S B ^a   Zhou, S B ^a   Huang, G ^a   Yi, X J ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Far IR sensors; Ion beam sputtering; Temperature coefficient of resistance; Vanadium oxide thin film

Indexed keywords

ANNEALING; FILM GROWTH; INFRARED RADIATION; ION BEAMS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION;

DEPOSITION TEMPERATURE; FAR INFRARED SENSORS; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR); THERMAL-SENSITIVE MATERIALS;

THIN FILMS;

COATING;

EID: 10944222842     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.03.026     Document Type: Article

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