Analysis of competing bonding parameters. Part 2. The structure of halosilanes and halogermanes (MH 4-nX n, n=1-4; M=Si, Ge; X=F, Cl, Br)

Journal of Molecular Structure: THEOCHEM

Volumn 713, Issue 1-3, 2005, Pages 215-226

  Donald, Kelling J ^a   Böhm, Michael C ^a   Lindner, Hans J ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Chemical bonding; Electrostatic interaction; Geometry; Halogermanes; Halosilanes; Hybridization

Indexed keywords

SILANE DERIVATIVE;

AB INITIO CALCULATION; ANALYTIC METHOD; ARTICLE; CHEMICAL BOND; CHEMICAL REACTION; CHEMICAL STRUCTURE; GEOMETRY; QUALITATIVE ANALYSIS; REDUCTION; STRUCTURE ANALYSIS;

EID: 10844276235     PISSN: 01661280     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.theochem.2004.10.022     Document Type: Article

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