Conductivity drop and crystallites redistribution in gold film

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 3, 2005, Pages 659-665

  Chen, G ^a   Hui, P ^b   Pita, K ^a   Hing, P ^c   Kong, L ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NOKIA RESEARCH CENTER   (United States)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSATLLITE SIZE; FILM THICKNESS; GOLD FILM; SILION SUBSTRATES;

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; ELECTRIC CONDUCTIVITY; ELECTRON SCATTERING; EVAPORATION; MICROCRACKS; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLIZATION;

EID: 10844251029     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2321-3     Document Type: Article

References (21)

1. T. Starz, U. Schmidt, F. Volklein, Sens. Mater. 7, 395 (1995)
2. Z.L. Wu, P.K. Kuo, Lanhua Wei, S.L. Gu, R.L. Thomas: Thin Solid Films 236, 191 (1993)
3. G. Langer, J. Hartmann, M. Reichling: Rev. Sci. Instrum. 68, 1510 (1997)
4. T.Q. Qiu, C.L. Tien, Trans. ASME 115, 842 (1993)
5. T. Yamane, Y. Mori, S. Katayama, M. Todoki: J. Appl. Phys. 82, 1153 (1997)
6. O.W. Kading, H. Skurk, E. Matthias, J. Phys. IV, C7, 619 (1994)
7. G. Chen, P. Hui: Appl. Phs. Lett. 74, 2942 (1999)
8. W.N. Juhng, T. Matsumoto, T. Baba, A. Ono, D.J. Seong, Proc. 5th Asian Thermophysical Properties Conf., Seoul, Korea (1998) p.641
9. M. Omar: Elementary Solid State Physics, (Addison-Wesley, Reading, 1975) Chapt. 4
10. S. Kumar, G.C. Vradis, Trans. ASME 116, 28 (1994)
11. J.W.C. De Vries: Thin Solid Films 167, 25 (1988)
12. S.O. Kasap: Principles of Electrical Engineering Materials and Devices (McGraw-Hill, 1997) Chapt. 1
13. J.C. Lambropoulos, S.D. Jacobs, S.J. Burns, L. Shaw-Klein, S.-S. Hwang, Proc. ASME Conf., Atlanta, GA, HTD-Vol.184 (1991) p. 21
14. A. Redondo, J G. Beery: J. Appl. Phys. 60, 3882 (1986)
15. G. Chen: Ph.D. Dissertation, School of Electrical Engineering, Nanyang Technological University, Singapore (2000)
16. D.K. Schroder Semiconductor Material and Device Characterization (Wiley, 1990) Chapt. 1
17. W.D. Callister Jr.: Materials Science and Engineering An Introduction, 4th ed. (Wiley, 1997) p.797
18. B.D. Cullity: Element of X-ray Diffraction (Addison-Wesley, 1978) Chapt. 9
19. B.D. Cullity: Element of X-ray Diffraction (Addison-Wesley, 1978) Chapt. 3 and Appendix 5
20. C. Suryanarayana, M. Grant Norton: X-Ray Diffraction, A Practical Approach (Plenum Press, New York 1998) Chapt. 3 and Appendix 10
21. H.P. Klug, L.E. Alexander: X-Ray Diffraction procedures for Polycrystalline and Amorphous Materials, Chapt. 9 (Wiley, 1974)