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Volumn 87, Issue 1, 2004, Pages 28-45

Triplet-Sensitized Photodeprotection of Oligonucleotides in Solution and on Microarray Chips

(10) Wöll, Dominik a Walbert, Stefan a Stengele, Klaus Peter b Albert, Tom J c Richmond, Todd c Norton, Jason c Singer, Michael c Green, Roland D c Pfleiderer, Wolfgang a Steiner, Ulrich E a

a UNIVERSITY OF KONSTANZ (Germany)

b Chemogenix GmbH (Germany)

c Roche NimbleGen Inc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS; PHOTOLITHOGRAPHY; REACTION KINETICS; SUBSTRATES; SYNTHESIS (CHEMICAL);

MICROARRAY CHIPS; PHOTODEPROTECTION;

NITROGEN COMPOUNDS;

2 (2 NITROPHENYL)PROPYL DERIVATIVE; 2 NITROPHENOL; 9H THIOXANTHEN 9 ONE; GLASS; OLIGONUCLEOTIDE; THIOXANTHENE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL REACTION; DEPROTECTION REACTION; DIFFUSION; DNA MICROARRAY; FLUORESCENCE; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYBRIDIZATION; KINETICS; PHOTOLYSIS; PHOTOSENSITIVITY; PRIORITY JOURNAL; SYNTHESIS;

EID: 10744229884 PISSN: 0018019X EISSN: None Source Type: Journal
DOI: 10.1002/hlca.200490015 Document Type: Article

Times cited : (42)

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