Fabrication and Characterization of AlGaAs-based Photonic Crystal Slab Waveguides by Precisely Controlled Self-Aligned Selective-Oxidation Process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 12, 2003, Pages 7331-7338

  Tanaka, Yu ^a   Sugimoto, Yoshimasa ^a   Ikeda, Naoki ^a   Yang, Tao ^a   Asakawa, Kiyoshi ^a   Watanabe, Yoshinori ^b   Inoue, Kuon ^c   Maruyama, Taishi ^c   Miyashita, Kazuya ^c   Ishida, Koji ^c  

^a WASEDA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c CHITOSE INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

3D FDTD; AlGaAs; Oxide cladding; Photonic crystal waveguide; Self aligned selective oxidation; Strain relaxation; Tapered ridge waveguide

Indexed keywords

ALUMINUM COMPOUNDS; CLADDING (COATING); FINITE DIFFERENCE METHOD; NONLINEAR OPTICS; OPTICAL SWITCHES; OPTOELECTRONIC DEVICES; OXIDATION; REFRACTIVE INDEX; TELECOMMUNICATION NETWORKS; TIME DOMAIN ANALYSIS; WAVELENGTH DIVISION MULTIPLEXING;

3D FDTD; ALGAAS; OXIDE CLADDING; PHOTONIC CRYSTAL WAVEGUIDES; SELF-ALIGNED SELECTIVE OXIDATION; STRAIN RELAXATION; TAPERED RIDGE WAVEGUIDE;

WAVEGUIDES;

EID: 10744229293     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7331     Document Type: Article

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