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Volumn 43, Issue 11, 2003, Pages 1501-1504

Maturing ECRF technology for plasma control

Author keywords

[No Author keywords available]

Indexed keywords

EIGENVALUES AND EIGENFUNCTIONS; ELECTRIC LOADS; ELECTRONS; FUSION REACTIONS; GYROTRONS; MICROWAVES; PLASMAS; SUPERCONDUCTING MAGNETS; TOKAMAK DEVICES;

EID: 10744221408     PISSN: 00295515     EISSN: None     Source Type: Journal    
DOI: 10.1088/0029-5515/43/11/022     Document Type: Conference Paper
Times cited : (23)

References (10)
  • 5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.