|
Volumn 43, Issue 11, 2003, Pages 1501-1504
|
Maturing ECRF technology for plasma control
|
Author keywords
[No Author keywords available]
|
Indexed keywords
EIGENVALUES AND EIGENFUNCTIONS;
ELECTRIC LOADS;
ELECTRONS;
FUSION REACTIONS;
GYROTRONS;
MICROWAVES;
PLASMAS;
SUPERCONDUCTING MAGNETS;
TOKAMAK DEVICES;
MAGNETIC CONFINEMENT DEVICES;
PLASMA CONTROL;
ELECTRON CYCLOTRON RESONANCE;
|
EID: 10744221408
PISSN: 00295515
EISSN: None
Source Type: Journal
DOI: 10.1088/0029-5515/43/11/022 Document Type: Conference Paper |
Times cited : (23)
|
References (10)
|