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Volumn 37, Issue 1, 2005, Pages 9-17
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Design consideration of δ-doping channels for high-performance n +-GaAs/p+-InGaP/n-GaAs camel-gate field effect transistors
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Author keywords
doping channel; Camel gate; Field effect transistors; Gate voltage swing; N+ GaAs p+ InGaP n GaAs; Potential barrier height; Transconductance
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Indexed keywords
COMPUTER SIMULATION;
ELECTRIC CURRENTS;
HETEROJUNCTIONS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
OHMIC CONTACTS;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR METAL BOUNDARIES;
THRESHOLD VOLTAGE;
TRANSCONDUCTANCE;
Δ-DOPING CHANNELS;
CAMEL GATES;
GATE VOLTAGE SWING;
N+-GAAS/P+-INGAP/N-GAAS;
POTENTIAL BARRIER HEIGHTS;
GATES (TRANSISTOR);
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EID: 10644271553
PISSN: 07496036
EISSN: None
Source Type: Journal
DOI: 10.1016/j.spmi.2004.06.002 Document Type: Article |
Times cited : (3)
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References (13)
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