Tuning the growth orientation of NiFe2O4 films by appropriate underlayer selection

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 2, 2005, Pages 427-431

  Luders U ^a,b   Bibes, M ^c,d   Bobo, J F ^b   Fontcuberta, J ^a  

^a INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^b 2 Avenue Edouard Belin   (France)

^c CNRS   (France)

^d UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; CRYSTALLINE MATERIALS; ELASTICITY; FILM GROWTH; INTERFACES (MATERIALS); NICKEL COMPOUNDS;

DC SPUTTERING; GROWTH ORIENTATION; SPINELS; TEMPLATES;

THIN FILMS;

EID: 10644220311     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2886-5     Document Type: Article

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