Optimization of thickness uniformity in electrodeposition onto a patterned substrate

Materials Transactions

Volumn 45, Issue 10, 2004, Pages 3005-3010

  Oh, Young Joo ^a   Chung, Soon Hyo ^a   Lee, Man Seung ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Mokpo National University   (South Korea)

Author keywords

Auxiliary electrode; Electrodeposition; Finite element method; Uniformity of current distribution

Indexed keywords

CATHODES; COMPUTER SIMULATION; FINITE ELEMENT METHOD; LITHOGRAPHY; PARAMETER ESTIMATION; ULTRAVIOLET RADIATION;

AUXILIARY ELECTRODE; DEPOSITION RATE; PADDLES; UNIFORMITY OF CURRENT DISTRIBUTION;

ELECTRODEPOSITION;

EID: 10444279392     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.45.3005     Document Type: Article

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