Growth of high-quality precipitate-free thin films suitable for electronic devices: A new concept for substrates

Advanced Materials

Volumn 16, Issue 21, 2004, Pages 1894-1897

  Endo, Kazuhiro ^a   Badica, Petre ^b,c   Sato, Hiroshi ^a   Akoh, Hiroshi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ELECTRONIC EQUIPMENT; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); SINGLE CRYSTALS; SUBSTRATES; SUPERLATTICES; ULTRATHIN FILMS;

ELECTRONIC DEVICES; MIGRATION ENERGY; PRECIPITATE SEGREGATION;

THIN FILMS;

EID: 10444276635     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200400750     Document Type: Article

References (8)

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