Progress and problems of High-k: materials

Rengong Jingti Xuebao/Journal of Synthetic Crystals

Volumn 33, Issue 5, 2004, Pages 731-735

  Yang, Xue Na ^a   Wang, Hong ^a   Zhang, Yin ^a   Yao, Wei Feng ^a   Shang, Shu Xia ^a   Zhou, Jing Tao ^a   Liu, Yan Hui ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Gate dielectric; High k materials; MOSFET; Thin films

Indexed keywords

EID: 10444265154     PISSN: 1000985X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (23)