메뉴 건너뛰기




Volumn 85, Issue 4, 2005, Pages 573-586

Influence of sputtering conditions on the solar and luminous optical properties of amorphous LixWoy thin films

Author keywords

Composition; Lithium intercalation; Optical absorption; Sputtered amorphous tungsten oxide

Indexed keywords

ELECTROCHROMISM; INDIUM COMPOUNDS; LIGHT ABSORPTION; POLARONS; SPUTTERING; TEMPERATURE CONTROL; X RAY DIFFRACTION;

EID: 10444248264     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.05.016     Document Type: Article
Times cited : (12)

References (28)
  • 5
    • 0020114149 scopus 로고
    • Preparation and properties of reactively sputtered tungsten oxide films
    • H. Kaneko, K. Miyake, Y. Teramoto, Preparation and properties of reactively sputtered tungsten oxide films, J. Appl. Phys. 53 (1982) 3070-3075.
    • (1982) J. Appl. Phys. , vol.53 , pp. 3070-3075
    • Kaneko, H.1    Miyake, K.2    Teramoto, Y.3
  • 6
    • 0020138952 scopus 로고
    • Electrochromism of RF reactively sputtered tungsten-oxide films
    • H. Kaneko, K. Miyake, Y. Teramoto, Electrochromism of RF reactively sputtered tungsten-oxide films, J. Appl. Phys. 53 (1982) 4416-4421.
    • (1982) J. Appl. Phys. , vol.53 , pp. 4416-4421
    • Kaneko, H.1    Miyake, K.2    Teramoto, Y.3
  • 7
    • 0020826267 scopus 로고
    • Physical and electrochemichromic properties of RF sputtered tungsten oxide films
    • K. Miyake, H. Kaneko, N. Suedomi, S. Nishimoto, Physical and electrochemichromic properties of RF sputtered tungsten oxide films, J. Appl. Phys. 54 (1983) 5256-5261.
    • (1983) J. Appl. Phys. , vol.54 , pp. 5256-5261
    • Miyake, K.1    Kaneko, H.2    Suedomi, N.3    Nishimoto, S.4
  • 8
    • 36549091708 scopus 로고
    • Physical and electrochemichromic properties of RF sputtered tungsten oxide films
    • H. Kaneko, S. Nishimoto, K. Miyake, N. Suedomi, Physical and electrochemichromic properties of RF sputtered tungsten oxide films, J. Appl. Phys. 59 (1986) 2526-2534.
    • (1986) J. Appl. Phys. , vol.59 , pp. 2526-2534
    • Kaneko, H.1    Nishimoto, S.2    Miyake, K.3    Suedomi, N.4
  • 9
    • 36549093170 scopus 로고
    • Electrochromic properties of RF-sputtered tungstic oxide film prepared from a W metal target
    • H. Akram, M. Kitao, S. Yamada, Electrochromic properties of RF-sputtered tungstic oxide film prepared from a W metal target, J. Appl. Phys. 66 (1989) 4364-4367.
    • (1989) J. Appl. Phys. , vol.66 , pp. 4364-4367
    • Akram, H.1    Kitao, M.2    Yamada, S.3
  • 11
    • 0022012314 scopus 로고
    • x (x<3) electrochromic thin films
    • x (x<3) electrochromic thin films, J. Appl. Phys. 57 (1985) 911-919.
    • (1985) J. Appl. Phys. , vol.57 , pp. 911-919
    • Yoshimura, T.1
  • 13
    • 0001356520 scopus 로고
    • Optical absorption of free small polarons at high temperatures
    • T. He, Optical absorption of free small polarons at high temperatures, Phys. Rev. B 51 (1995) 16689-16694.
    • (1995) Phys. Rev. B , vol.51 , pp. 16689-16694
    • He, T.1
  • 14
    • 0000927186 scopus 로고
    • Optical intraband absorption in disordered systems with a strong electron-phonon interaction
    • V.V. Bryksin, Optical intraband absorption in disordered systems with a strong electron-phonon interaction, Fiz. Tverd. Tela. 24 (1982) 1110-1117.
    • (1982) Fiz. Tverd. Tela. , vol.24 , pp. 1110-1117
    • Bryksin, V.V.1
  • 16
    • 0040752826 scopus 로고    scopus 로고
    • Polaron absorption in amorphous tungsten oxide films
    • L. Berggren, A. Azens, G.A. Niklasson, Polaron absorption in amorphous tungsten oxide films, J. Appl. Phys. 90 (2001) 1860-1863.
    • (2001) J. Appl. Phys. , vol.90 , pp. 1860-1863
    • Berggren, L.1    Azens, A.2    Niklasson, G.A.3
  • 17
    • 10444279199 scopus 로고    scopus 로고
    • Reflectance values of BaSO4, from earlier unpublished work
    • Reflectance values of BaSO4, from earlier unpublished work.
  • 21
    • 0024731404 scopus 로고
    • Extraction of extinction coefficient of weak absorbing thin films from special absorption
    • W.Q. Hong, Extraction of extinction coefficient of weak absorbing thin films from special absorption, J. Phys. D: Appl. Phys. 22 (1989) 1384-1385.
    • (1989) J. Phys. D: Appl. Phys. , vol.22 , pp. 1384-1385
    • Hong, W.Q.1
  • 23
    • 0028461009 scopus 로고
    • Microelectrode studies of the lithium/propylene carbonate system - Part I electrode reactions at potentials positive to lithium deposition
    • D. Pletcher, J.F. Rohan, A.G. Ritchie, Microelectrode studies of the lithium/propylene carbonate system - Part I electrode reactions at potentials positive to lithium deposition, Electrochim. Acta. 39 (1994) 1369-1376.
    • (1994) Electrochim. Acta. , vol.39 , pp. 1369-1376
    • Pletcher, D.1    Rohan, J.F.2    Ritchie, A.G.3
  • 24
    • 10444226499 scopus 로고    scopus 로고
    • private communication
    • L. Nyholm, private communication.
    • Nyholm, L.1
  • 25
    • 0017542659 scopus 로고
    • Tran minh due, color in "tungsten trioxid thin films
    • P. Gerard, A. Deneuville, G. Hollinger, Tran Minh Due, Color in "tungsten trioxid thin films, J. Appl. Phys. 48 (1977) 4252-4255.
    • (1977) J. Appl. Phys. , vol.48 , pp. 4252-4255
    • Gerard, P.1    Deneuville, A.2    Hollinger, G.3
  • 27
    • 0035761259 scopus 로고    scopus 로고
    • y films: Influence of sputtering conditions
    • y films: influence of sputtering conditions, Proc. SPIE 4458 (2001) 186.
    • (2001) Proc. SPIE , vol.4458 , pp. 186
    • Berggren, L.1    Niklasson, G.A.2
  • 28
    • 0033734769 scopus 로고    scopus 로고
    • Effect of oxygen on the electrochromism of RF reactive magnetron sputter deposited tungsten oxide
    • J.L. He, M.C. Chiu, Effect of oxygen on the electrochromism of RF reactive magnetron sputter deposited tungsten oxide, Surface Coating Technol. 127 (2000) 43-51.
    • (2000) Surface Coating Technol. , vol.127 , pp. 43-51
    • He, J.L.1    Chiu, M.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.