Silicon immersion gratings for very high resolution infrared spectroscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5494, Issue , 2004, Pages 536-544

  McDavitt, Dan ^a,b   Ge, Jian ^a,b   Miller, Shane ^a,b   Wang, Junfeng ^a,b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b 211 Bryant Space Science Center ^*  (United States)

Author keywords

Chemical etching; High resolution spectroscopy; Infrared; Silicon grism; Silicon immersion grating

Indexed keywords

CHEMICAL ETCHING; HIGH RESOLUTION SPECTROSCOPY; SILICON GRISM; SILICON IMMERSION GRATINGS;

CRYSTAL STRUCTURE; DIFFRACTION GRATINGS; DISPERSIONS; ETCHING; INFRARED SPECTROSCOPY; LIGHT SCATTERING; POTASSIUM COMPOUNDS; SPACE APPLICATIONS; THROUGHPUT; WAVEFRONTS;

SILICON;

EID: 10444241981     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.552028     Document Type: Conference Paper

References (4)

1. Dekker, H., 1987, Instrumentation for ground-based optical astronomy, 183
2. Ge, J., McDavitt, D., Bernecker, J., Ciarlo, D., & Kuzmenko, P. 2001, Proc. SPIE, 4485, 393
3. Ge, J., Bernecker, J.L., McDavitt, D.L., & Miller, S., 2003, Proc. SPIE, 4840, 624
4. Takeda & Kobayashi, 1982, J.Opt.Soc.Am., 72, 156