Diffusion-related implications for langasite resonator operation

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 51, Issue 11, 2004, Pages 1381-1387

  Schulz, Michal ^a   Fritze, Holger ^a   Tuller, Harry L ^b   Seh, Huankiat ^b  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK ELECTRICAL CONDUCTIVITY; ELECTRODE DEGRADATION; LANGASITE RESONATORS; SELF-DIFFUSION;

DIFFUSION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; GALLIUM; KINETIC THEORY; OXYGEN; PARTIAL PRESSURE; PIEZOELECTRIC MATERIALS; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

RESONATORS;

EID: 10444241034     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2004.1367476     Document Type: Article

References (12)

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