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Volumn 1, Issue , 2004, Pages 437-443

Continuous operation at 200°C device junction temperature: The final frontier for RF power semiconductor plastic packaging

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE JUNCTION TEMPERATURE; LATERALLY DIFFUSED METAL OXIDE SEMICONDUCTOR (LDMOS) DEVICES; PLASTIC PACKAGING; RELIABILITY TESTING;

EID: 10444240080     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (2)

References (5)
  • 1
    • 10444287778 scopus 로고    scopus 로고
    • Aluminum - Based metallization enhances device reliability
    • Burger, Wayne et.al "Aluminum - Based Metallization Enhances Device Reliability," Microwaves and RF, Vol.37, No. 10 (1998), pp. 61-68.
    • (1998) Microwaves and RF , vol.37 , Issue.10 , pp. 61-68
    • Burger, W.1
  • 3
    • 0014863540 scopus 로고
    • Intermetallic formation in gold-aluminum systems
    • Philofsky, E., "Intermetallic Formation in Gold-Aluminum Systems," Solid State Electronics Vol 13 1970, pp 1391-1399
    • (1970) Solid State Electronics , vol.13 , pp. 1391-1399
    • Philofsky, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.