High-Throughput Chemical Vapor Deposition System and Thin-Film Silicon Library

Macromolecular Rapid Communications

Volumn 25, Issue 1, 2004, Pages 326-329

  Wang, Qi ^a   Liu, Fengzhen ^a   Han, Daxing ^b  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^b University of North Carolina at Chapel Hill   (United States)

Author keywords

Hot wire chemical vapor deposition (HWCVD); Hydrogenated amorphous silicon (a Si:H); Microcrystalline silicon ( c Si); Raman spectroscopy; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GLASS; HYDROGEN; SILANES; SUBSTRATES; THIN FILMS;

MICROCRYSTALLINE MATERIALS;

SILICON;

HYDROGEN; SILANE; SILICON;

ARTICLE; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; FILM; HIGH THROUGHPUT SCREENING; HYDROGENATION; RAMAN SPECTROMETRY; REACTION ANALYSIS; STRUCTURE ANALYSIS; TECHNIQUE;

EID: 1042281055     PISSN: 10221336     EISSN: None     Source Type: Journal    
DOI: 10.1002/marc.200300151     Document Type: Article

References (20)

1. D. L. Staebler, C. R. Wronski, Appl. Phys. Lett. 1977, 31, 292.
2. Q. Gu, Q. Wang, E. A. Schiff, Y.-M. Li, C. T. Malone, J. Appl. Phys. 1994, 76, 2310.
3. R. W. Collins, J. Koh, A. S. Ferlauto, P. I. Rovira, Y. Lee, R. J. Koval, C. R. Wronski, Thin Solid Films 2000, 364, 129.
4. J. Yang, S. Guha, Mater. Res. Soc. Proc. 1999, 557, 239.
5. M. Kondo, M. Fukawa, L. Guo, A. Matsuda, J. Non-Cryst. Solids 2000, 266-269, 84.
6. X.-D. Xiang, X. Sun, G. Briceno, Y. Lou, K.-A. Wang, H. Chang, W. G. Wallace-Freedman, S.-W. Chen, P. G. Schultz, Science 1995, 268, 1738.
7. W. L. Gladfelter, R. Smith, N. Hoilien, J. Roberts, S. A. Campbell, Appl. Surf. Sci., to be published.
8. Q. Wang, J. Perkins, H. Branz, J. Alleman, C. Duncan, D. Ginley, Appl. Surf. Sci. 2002, 189, 271.
9. H. Aiyer, D. Nishioka, R. Maruyama, H. Shinno, N. Matsuki, K. Miyazaki, H. Fujioka, H. Koinuma, Jpn. J. Appl. Phys. 2001, 40(1AB), L81.
10. J. J. Hanak, J. Mat. Sci. 1970, 5, 964.
11. B. P. Nelson, Q. Wang, E. Iwaniczko, A. H. Mahan, R. S. Crandall, Mater. Res. Soc. Proc. 1998, 507, 927.
12. A. H. Mahan, J. Carapella, B. P. Nelson, R. S. Crandall, I. Balberg, J. Appl. Phys. 1991, 69, 6728.
13. H. Matsumura, Jpn. J. Appl. Phys. 1986, 25, L949.
14. Q. Wang, Thin Solid Films 2002, 430, 78.
15. Q. Wang, G. Yue, J. Li, D. Han, Solid Sate Commun. 2000, 113, 175.
16. H. N. Wanka, M. B. Schubert, Mater. Res. Soc. Proc. 1997, 467, 651.
17. G. Yue, J. D. Lorentzen, J. Lin, D. Han, Q. Wang, Appl. Phys. Lett. 1999, 67, 3468.
18. G. Yue, J. Lin, L. Wu, D. Han, Q. Wang, Mater. Res. Soc. Proc. 1999, 557, 525.
19. D. Han, J. D. Lorentzen, J. Wenberg-Wolf, L. E. McNeil, Q. Wang, J. Appl. Phys. 2003, 94, 2930.
20. E. C. Molenbroek, A. H. Mahan, A. Gallagher, J. Appl. Phys. 1997, 82, 1909.