Atomic force microscopy: A powerful tool for surface defect and morphology inspection in semiconductor industry

EPJ Applied Physics

Volumn 27, Issue 1-3, 2004, Pages 101-106

  Borionetti, G ^a   Bazzali, A ^a   Orizio, R ^a  

^a MEMC Electronic Materials SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; FINISHING; INDUSTRIAL APPLICATIONS; INSPECTION; LIGHT SCATTERING; MORPHOLOGY; PROCESS CONTROL; SEMICONDUCTOR MATERIALS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

ATOMIC FORCE MICROSCOPES; MORPHOLOGY INSPECTION; SEMICONDUCTOR INDUSTRY; SURFACE DEFECTS;

ATOMIC FORCE MICROSCOPY;

EID: 10244251531     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2004129     Document Type: Conference Paper

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