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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2234-2238

GeO2-doped SiO2 sputtered thin films: Microstructure, stoichiometry, and optical properties

(5) Quartarone, E a Mustarelli, P a Marabelli, F a Battagliarin, M b Turato, S b

a UNIVERSITY OF PAVIA (Italy)

b CNR (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; DOPING (ADDITIVES); ELLIPSOMETRY; GROWTH KINETICS; INCLUSIONS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; SECONDARY ION MASS SPECTROMETRY; SILICA; SOL-GELS; STOICHIOMETRY; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS;

FILM DEPOSITION; LIGHT WAVELENGTH; NONREACTIVE PREPARATION; RADIO-FREQUENCY (RF) MAGNETRON SPUTTERING; SPECTRAL ELLIPSOMETRY;

THIN FILMS;

EID: 10244243748 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1789213 Document Type: Article

Times cited : (5)

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