Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resin

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2373-2378

  Sugitani, Suehiro ^a   Matsuzaki, Hideaki ^a   Enoki, Takatomo ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; RESINS; STRESSES; THERMAL EFFECTS;

CARRIER GAS; REACTION CHAMBERS; ULTRAFINE STRUCTURES; VAPORIZATION CONTROLLERS;

THIN FILMS;

EID: 10244219895     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1806438     Document Type: Article

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