Characterization of very small aperture GaN lasers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5380, Issue , 2004, Pages 393-402

  Ohno, Tomoki ^a   Itagi, A V ^b   Chen, Fang ^b   Bain, J A ^b   Schlesinger, T E ^b  

^a SHARP LABORATORIES OF AMERICA   (United States)

^b CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

Far Field; Finite Difference Frequency Domain (FDFD); GaN; Nano aperture; Near Field; Surface Plasmon (Sp); Very Small Aperture Laser (VSAl)

Indexed keywords

ALUMINUM; DRY ETCHING; FABRICATION; LASERS; LIGHT TRANSMISSION; MAGNETIC RECORDING; MATHEMATICAL MODELS; TRANSDUCERS;

FAR-FIELD; FINITE-DIFFERENCE FREQUENCY-DOMAIN (FDFD); NANO-APERTURE; NEAR-FIELD; SURFACE PLASMON (SP); VERY SMALL APERTURE LASERS (VSAL);

GALLIUM NITRIDE;

EID: 10044281929     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.556991     Document Type: Conference Paper

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