Atomic force microscopy-based nano-lithography for nano-patterning: A molecular dynamic study

Journal of Materials Processing Technology

Volumn 155-156, Issue 1-3, 2004, Pages 1847-1854

  Kim, Y S ^a   Na, K H ^b   Choi, S O ^b   Yang, S H ^a  

^a Kyungpook National University   (South Korea)

^b Korea Institute of Industrial Technology   (South Korea)

Author keywords

AFM; MEMS; Molecular dynamics simulation; Nano lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; DISLOCATIONS (CRYSTALS); ELECTRIC DISCHARGE MACHINING; MAXWELL EQUATIONS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; POTENTIAL ENERGY; CUTTING; DEFORMATION; LITHOGRAPHY; MACHINE COMPONENTS; MEMS; MORSE POTENTIAL; NANOLITHOGRAPHY; SURFACE PROPERTIES; THREE DIMENSIONAL COMPUTER GRAPHICS;

CHIP FORMATION; MEMS; MOLECULAR DYNAMICS SIMULATION; NANO-PATTERNING;

NANOTECHNOLOGY; MOLECULAR DYNAMICS;

AFM; ATOMIC FORCE; CUTTING FORCES; CUTTING SPEED; MACHINED MATERIALS; MATERIAL SURFACE; MEMSDEVICES; MOLECULAR DYNAMICS SIMULATIONS; MONOCRYSTALLINE COPPER; MORSE FUNCTIONS; NANODEFORMATION; NANOPATTERNING; PROCESS VARIABLES; THRUST FORCES; TOOL SHAPES; UNDEFORMED CHIP THICKNESS;

EID: 10044250977     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2004.04.377     Document Type: Article

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