Deposition diagnostics for next-step devices (invited)

Review of Scientific Instruments

Volumn 75, Issue 10 II, 2004, Pages 4213-4218

  Skinner, C H ^a   Roquemore, A L ^a   Bader, A ^b   Wampler, W R ^c  

^a PRINCETON PLASMA PHYSICS LABORATORY   (United States)

^b The Cooper Union for the Advancement of Science and Art   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC INTERACTIONS; HYDROGEN ISOTOPES; LASER SCATTERING; PLASMA FACING COMPONENTS (PFC);

AMORPHOUS MATERIALS; ELECTRIC CHARGE; GLOW DISCHARGES; ION BEAMS; PLASMA DENSITY; QUARTZ; RAMAN SCATTERING; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

PLASMA DIAGNOSTICS;

EID: 10044235368     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1783600     Document Type: Conference Paper

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