Shape deviations in masks for optical structures produced by electron beam lithography

Microsystem Technologies

Volumn 10, Issue 6-7, 2004, Pages 527-530

  Last, A ^a   Hein, H ^a   Mohr, J ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MIRRORS; X RAYS;

MICROSPECTROMETERS; OPTICAL MICROSTRUCTURE; OPTICAL STRUCTURES;

MASKS;

EID: 10044233065     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0386-3     Document Type: Conference Paper

References (3)

1. Müller C; Mohr J (1995) Miniaturisiertes Spektrometersystem in LIGA-Technik, Wissenschaftliche Berichte FZKA 5609
2. Last A (2003) Fehllicht in LIGA-Mikrospektrometern, Wissenschaftliche Berichte FZKA 6885
3. Menz W; Mohr J (1997) Mikrosystemtechnik für Ingenieure, 2., erweiterte Auflage, VCH Verlagsgesellschaft, Weinheim