Nonlithographic approach to nanostructure fabrication using a scanned electrospinning source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2994-2997

  Czaplewski, David ^a   Kameoka, Jun ^a   Craighead, H G ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ELECTRODES; ELECTROSTATICS; ETCHING; FABRICATION; HYDROFLUORIC ACID; MASKS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA THEORY; POLYMETHYL METHACRYLATES; SCANNING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

ELECTROSPINNING PROCESSES; MICROFABRICATION; PLASMA CHEMISTRY;

NANOTECHNOLOGY;

EID: 0942300024     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627800     Document Type: Conference Paper

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