Reactivity of restatoms and adatoms in Cl adsorption at a Si(111)-7×7 surface

Journal of Chemical Physics

Volumn 119, Issue 24, 2003, Pages 13077-13082

  Shudo, K ^a   Washio, H ^a   Tanaka, M ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHLORINE; DESORPTION; HYDROGEN BONDS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE PHENOMENA; SURFACE STRUCTURE;

ADATOMS; RESTATOMS; SURFACE DIFFERENTIAL REFLECTIVITY SPECTROSCOPY; THERMAL DESORPTION SPECTROSCOPY;

ADSORPTION;

EID: 0942288913     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1628673     Document Type: Article

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