Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition

Applied Physics Letters

Volumn 83, Issue 25, 2003, Pages 5307-5309

  Whittaker, Jed D ^a   Brink, Markus ^b   Husseini, Ghaleb A ^a   Linford, Matthew R ^a   Davis, Robert C ^a  

^a Brigham Young University   (United States)

^b Laboratory of Atomic and Solid State Physics and Sibley School of Mechanical and Aerospace Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL ATTACHMENT; TRENCHED WAFERS;

ADHESIVES; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; LITHOGRAPHY; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NANOTUBES;

EID: 0942288896     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1636267     Document Type: Article

References (13)

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10. 2 film thickness using standard XPS theory [C. S. Fadley, R. J. Baird, W. Siekhaus, T. Novakov, and S. Å. L. Berström, J. Electron Spectrosc. 4, 93 (1974)]. Literature values for the mean free paths of Si 2p photoelectrons in silicon (1.6 nm) and silicon dioxide (2.6 nm) were used in these calculations [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988); M. Suzuki, H. Ando, Y. Higashi, H. Takenaka, H. Shimada, N. Matsubayashi, M. Imamura, S. Kurosawa, S. Tanuma, and C. J. Powell, Surf. Interface Anal. 29, 330 (2000)]. Ellipsometry is known to yield thickness measurements up to 40% higher than XPS [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988)], Here, our ellipsometry measurements were ∼25% higher than our XPS measured thicknesses, within the expected agreement of the methods.
11. 2 film thickness using standard XPS theory [C. S. Fadley, R. J. Baird, W. Siekhaus, T. Novakov, and S. Å. L. Berström, J. Electron Spectrosc. 4, 93 (1974)]. Literature values for the mean free paths of Si 2p photoelectrons in silicon (1.6 nm) and silicon dioxide (2.6 nm) were used in these calculations [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988); M. Suzuki, H. Ando, Y. Higashi, H. Takenaka, H. Shimada, N. Matsubayashi, M. Imamura, S. Kurosawa, S. Tanuma, and C. J. Powell, Surf. Interface Anal. 29, 330 (2000)]. Ellipsometry is known to yield thickness measurements up to 40% higher than XPS [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988)], Here, our ellipsometry measurements were ∼25% higher than our XPS measured thicknesses, within the expected agreement of the methods.
12. 2 film thickness using standard XPS theory [C. S. Fadley, R. J. Baird, W. Siekhaus, T. Novakov, and S. Å. L. Berström, J. Electron Spectrosc. 4, 93 (1974)]. Literature values for the mean free paths of Si 2p photoelectrons in silicon (1.6 nm) and silicon dioxide (2.6 nm) were used in these calculations [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988); M. Suzuki, H. Ando, Y. Higashi, H. Takenaka, H. Shimada, N. Matsubayashi, M. Imamura, S. Kurosawa, S. Tanuma, and C. J. Powell, Surf. Interface Anal. 29, 330 (2000)]. Ellipsometry is known to yield thickness measurements up to 40% higher than XPS [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988)], Here, our ellipsometry measurements were ∼25% higher than our XPS measured thicknesses, within the expected agreement of the methods.
13. 2 film thickness using standard XPS theory [C. S. Fadley, R. J. Baird, W. Siekhaus, T. Novakov, and S. Å. L. Berström, J. Electron Spectrosc. 4, 93 (1974)]. Literature values for the mean free paths of Si 2p photoelectrons in silicon (1.6 nm) and silicon dioxide (2.6 nm) were used in these calculations [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988); M. Suzuki, H. Ando, Y. Higashi, H. Takenaka, H. Shimada, N. Matsubayashi, M. Imamura, S. Kurosawa, S. Tanuma, and C. J. Powell, Surf. Interface Anal. 29, 330 (2000)]. Ellipsometry is known to yield thickness measurements up to 40% higher than XPS [M. F. Hochella and A. H. Carim, Surf. Sci. 197, L260 (1988)], Here, our ellipsometry measurements were ∼25% higher than our XPS measured thicknesses, within the expected agreement of the methods.