Fabrication of nickel oxide nanostructures by atomic force microscope nano-oxidation and wet etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2599-2601

  Hsu, Ju Hung ^a   Lai, Hsin Wen ^a   Lin, Heh Nan ^a   Chuang, Chia Chih ^a   Huang, Jin Hua ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COATING TECHNIQUES; ETCHING; IMAGE ANALYSIS; LITHOGRAPHY; NICKEL COMPOUNDS; NITRIC ACID; OXIDATION; REDUCTION; SCANNING ELECTRON MICROSCOPY; SILICON; SOLUTIONS; TUNGSTEN CARBIDE;

NANO-OXIDATION; SCANNING PROBE LITHOGRAPHY (SPL);

NANOSTRUCTURED MATERIALS;

EID: 0942278367     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621655     Document Type: Article

References (13)

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