Trimethylsilylated Chitosan: A Convenient Precursor for Chemical Modifications

Chemistry Letters

Volumn 32, Issue 11, 2003, Pages 1074-1075

  Kurita, Keisuke ^a   Hirakawa, Masaaki ^a   Aida, Kaori ^a   Yang, Jin ^a   Nishiyama, Yasuhiro ^a  

^a SEIKEI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHITOSAN; CHLOROTRIMETHYLSILANE; HEXAMETHYLDISILAZANE; SILANE DERIVATIVE; TRIMETHYLSILYL DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL REACTION; PRECURSOR; SILYLATION; SOLUBILITY;

EID: 0842346968     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2003.1074     Document Type: Article

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14. 2O: C, 46.92; H, 9.30; N, 3.78%. Found: C, 46.99; H, 9.23; N, 3.79%.
15. 2O: C, 48.16; H, 6.18; N, 4.80%. Found: C, 48.02; H, 6.01; N, 4.79%.