A Uniform and Dense Microwave Plasma

IEICE Transactions on Electronics

Volumn E86-C, Issue 12, 2003, Pages 2479-2481

  Senda, Kazuaki ^a   Umehara, Koutarou ^a   Sakamoto, Yuichi ^b  

^a Micro Denshi Co Ltd   (Japan)

^b Consultant Office PTC ^*  (Japan)

Author keywords

Large area plasma; Microwave; Surface wave; Uniform dense plasma

Indexed keywords

ARGON; DIELECTRIC MATERIALS; DIFFUSION; ELECTROMAGNETIC WAVE PROPAGATION; ELECTRONS; MICROWAVES; SLOT ANTENNAS; SURFACE WAVES; WAVEGUIDES;

PARTICLE FLUX DENSITY; PLASMA CHAMBERS; VACUUM CHAMBERS;

PLASMA PROBES;

EID: 0842332040     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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5. K. Senda and Y. Sakamoto, "A large area processing plasma," ESCAMPIG & ICRP5, vol.2, p.321, Grenoble, France, 2002.
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7. A.B. Bronwell and R.E. Beam, Theory and Application of Microwave, Chapt. 19, McGraw-Hill, New York, 1947.
8. F.F. Chen, Introduction to Plasma Physics and Controlled Fusion, vol.1, p.245, Plenum Press, New York, 1984.