Radical detection in a methane plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1978-1980

  Kang, H D ^a   Dose, V ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ENTROPY; FREE RADICALS; HYDROCARBONS; LOW TEMPERATURE OPERATIONS; MASS SPECTROMETRY; MATHEMATICAL MODELS; MATRIX ALGEBRA; METHANE; MOLECULES; PARAMETER ESTIMATION;

BAYESIAN ANALYSIS; CRACKING COEFFICIENT; FREE RADICAL DETECTION; METHANE PLASMA; PLASMA BASED SURFACE PROCESSING; PLASMA REACTORS; QUADRUPOLE MASS SPECTROMETRY;

PLASMAS;

EID: 0842311739     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621405     Document Type: Article

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