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Volumn , Issue , 2003, Pages 225-228

2D QM simulation and optimization of decanano non-overlapped MOS devices

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CAPACITANCE; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; EIGENVALUES AND EIGENFUNCTIONS; ELECTRIC RESISTANCE; GATES (TRANSISTOR); LOGIC CIRCUITS; LOGIC DESIGN; QUANTUM THEORY; SWITCHING; THRESHOLD VOLTAGE; WAVE EQUATIONS;

EID: 0842309809     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (16)

References (9)
  • 1
    • 0036923438 scopus 로고    scopus 로고
    • FinFET scaling to 10 nm gate length
    • B. Yu et al., "FinFET scaling to 10 nm gate length," in IEDM Tech. Dig., pp. 251-254, 2002.
    • (2002) IEDM Tech. Dig. , pp. 251-254
    • Yu, B.1
  • 2
    • 0036928692 scopus 로고    scopus 로고
    • 14 nm gate length CMOSFETs utilizing low thermal budget process with poly-SiGe and Ni salicide
    • A. Hokazono et al., "14 nm gate length CMOSFETs utilizing low thermal budget process with poly-SiGe and Ni salicide," in IEDM Tech. Dig., pp. 639-642, 2002.
    • (2002) IEDM Tech. Dig. , pp. 639-642
    • Hokazono, A.1
  • 3
    • 0035718151 scopus 로고    scopus 로고
    • 16 nm planar NMOSFET manufacturable within state-of-the-art CMOS process thanks to specific design and optimization
    • F. Boeuf et al., "16 nm planar NMOSFET manufacturable within state-of-the-art CMOS process thanks to specific design and optimization," in IEDM Tech. Dig., pp. 637-640, 2001.
    • (2001) IEDM Tech. Dig. , pp. 637-640
    • Boeuf, F.1
  • 4
    • 0036923795 scopus 로고    scopus 로고
    • QDAME simulation of 7.5 nm double-gate Si nNFETs with differing access geometries
    • S. E. Laux, A. Kumar, and M. V. Fischetti, "QDAME simulation of 7.5 nm double-gate Si nNFETs with differing access geometries," in IEDM Tech. Dig., pp. 715-718, 2002.
    • (2002) IEDM Tech. Dig. , pp. 715-718
    • Laux, S.E.1    Kumar, A.2    Fischetti, M.V.3
  • 5
    • 0035717886 scopus 로고    scopus 로고
    • Examination of design and manufacturing issues in a 10 nm double gate MOSFET using nonequilibrium Green's function formalism
    • Z. Ren, R. Venugopal, S. Datta, and M. Lundstrom, "Examination of design and manufacturing issues in a 10 nm double gate MOSFET using nonequilibrium Green's function formalism," in IEDM Tech. Dig., pp. 107-110, 2001.
    • (2001) IEDM Tech. Dig. , pp. 107-110
    • Ren, Z.1    Venugopal, R.2    Datta, S.3    Lundstrom, M.4
  • 6
    • 0036538950 scopus 로고    scopus 로고
    • Macroscopic simulation of quantum mechanical effects in 2D MOS devices via the density gradient method
    • D. Connelly, Z. Yu, and D. Yergeau, "Macroscopic simulation of quantum mechanical effects in 2D MOS devices via the density gradient method," IEEE Trans. Electron Devices, vol. 49, pp. 619-626, 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , pp. 619-626
    • Connelly, D.1    Yu, Z.2    Yergeau, D.3
  • 8
    • 0031701877 scopus 로고    scopus 로고
    • A physically-based model of the effective mobility in heavily doped n-MOSFET's
    • S. Villa, A. L. Lacaita, L. M. Perron, and R. Bez, "A physically-based model of the effective mobility in heavily doped n-MOSFET's," IEEE Trans. Electron Devices, vol. 45, pp. 110-115, 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 110-115
    • Villa, S.1    Lacaita, A.L.2    Perron, L.M.3    Bez, R.4
  • 9
    • 0032648591 scopus 로고    scopus 로고
    • MOSFET simulation with quantum effects and non-local mobility model
    • A. S. Spinelli, A. Benvenuti, S. Villa, and A. L. Lacaita, "MOSFET simulation with quantum effects and non-local mobility model," IEEE Electron Dev. Lett., vol. 20, pp. 298-300, 1999.
    • (1999) IEEE Electron Dev. Lett. , vol.20 , pp. 298-300
    • Spinelli, A.S.1    Benvenuti, A.2    Villa, S.3    Lacaita, A.L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.