Tungsten inverse opals: The influence of absorption on the photonic band structure in the visible spectral region

Applied Physics Letters

Volumn 84, Issue 2, 2004, Pages 224-226

  Von Freymann, Georg ^a,b   John, Sajeev ^a   Schulz Dobrick, Martin ^a   Vekris, Evangellos ^a   Tétreault, Nicolas ^a   Wong, Sean ^a   Kitaev, Vladimir ^a   Ozin, Geoffrey A ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHEMICAL VAPOR DEPOSITION; CRYSTALS; DEPOSITION; LIGHT ABSORPTION; REFLECTION; SCANNING ELECTRON MICROSCOPY; TUNGSTEN; ULTRAVIOLET SPECTROSCOPY;

GRADIENT DEPOSITION TECHNIQUE; METALLIC PHOTONIC CRYSTALS; NEAR INFRARED SPECTRAL REGION; PHOTONIC BAND STRUCTURE; REFLECTANCE SPECTROSCOPY; TRANSMITTANCE SPECTROSCOPY; TUNGSTEN INVERSE OPALS; VISIBLE SPECTRAL REGION;

AMORPHOUS SILICON;

EID: 0842290109     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1639941     Document Type: Article

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