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Volumn 13, Issue 4, 1997, Pages 595-599
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Direct ICP-AES Determination of Trace Impurities in Silicon Dioxide Using Fluorinating Electrothermal Vaporization with Slurry Sampling
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Author keywords
Electrothermal vaporization; Inductively coupled plasma atomic emission spectroscopy; Polytetrafluoroethylene emulsion; Selective volatilization; Silicon dioxide slurry; Trace impurities
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Indexed keywords
ATOMIC EMISSION SPECTROSCOPY;
ELECTRIC HEATING;
EMULSIFICATION;
INDUCTIVELY COUPLED PLASMA;
PARTICLE SIZE;
PARTICLE SIZE ANALYSIS;
POLYTETRAFLUOROETHYLENES;
SILICA;
SILICON OXIDES;
VAPORIZATION;
ACID DECOMPOSITION;
CHEMICAL PRE-TREATMENT;
ELECTROTHERMAL VAPORIZATION;
INDUCTIVELY COUPLED PLASMA ATOMIC EMISSION SPECTROSCOPY;
PARTICLE SIZE EFFECT;
PNEUMATIC NEBULIZATION;
POLYTETRAFLUOROETHYLENE (PTFE);
TRACE IMPURITIES;
TRACE ANALYSIS;
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EID: 0642362216
PISSN: 09106340
EISSN: None
Source Type: Journal
DOI: 10.2116/analsci.13.595 Document Type: Article |
Times cited : (13)
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References (14)
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