In situ x-ray photoelectron spectroscopy and reflection high-energy electron diffraction study of diethylgalliumchloride adsorption on Si (100) and Si (111) surfaces

Applied Physics Letters

Volumn 57, Issue 17, 1990, Pages 1733-1735

  Sasaoka, C ^a   Kato, Y ^a   Usui, A ^a   Hirayama, H ^a   Tatsumi, T ^a  

^a NEC CORPORATION   (Japan)

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EID: 0642314057     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.104050     Document Type: Article

References (11)