Photosensitive polyimides with 2-nitro-xylylene structure

Journal of Photopolymer Science and Technology

Volumn 9, Issue 2, 1996, Pages 347-354

  Feng, Ke ^a   Matsumoto, Toshihiko ^a   Kurosaki, Toshikazu ^a  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0642291318     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.347     Document Type: Article

References (11)

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8. (a) T. Matsumoto and T.Kurosaki, Macromolecules, 28 (1995) 5684; (b) T.Matsumoto and T.Kurosaki, unpublished works.
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10. M.I. Bessonov, M.M.Koton, V.V.Kudryavtsev and L.A.Laius, Polyimide: Thermal Stable Polymers, Consultants Bureau, New York, (1987) p58.
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