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Volumn 37, Issue 7, 1998, Pages 657-661

Thermal rearrangement of aromatic acetal and thioacetal derivatives

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EID: 0542451752     PISSN: 03764699     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (31)
  • 2
    • 0542391732 scopus 로고    scopus 로고
    • U.S. patent, 4, 13, 739 (1977)
    • Donl M, U.S. patent, 4, 13, 739 (1977); Chem Abstr, 91, 1979, 19909d.
    • Donl, M.1
  • 3
    • 25744477160 scopus 로고
    • Donl M, U.S. patent, 4, 13, 739 (1977); Chem Abstr, 91, 1979, 19909d.
    • (1979) Chem Abstr , vol.91
  • 14
    • 0346349565 scopus 로고
    • Gaber A M, Phosphorus, Sulfur & Silicon, 55, 1991, 211; Abd El-Wahab A A, El-Khawaga A M & Ismail M T, Can J Chem, 60, 1982, 2870.
    • (1991) Phosphorus, Sulfur & Silicon , vol.55 , pp. 211
    • Gaber, A.M.1
  • 20
    • 80054022371 scopus 로고
    • Gaber A M & Abbady M S, Phosphorus, Sulfur & Silicon, 69, 1992, 7; Bergman E, J Chem Soc, 1936, 505.
    • (1936) J Chem Soc , pp. 505
    • Bergman, E.1
  • 22
    • 0542439256 scopus 로고
    • Lushchik V B & Skorokhodov S S, Zh Vses Khim obshchest, 14, 1969, 354; Chem Abstr, 71, 1969, 80848.
    • (1969) Chem Abstr , vol.71 , pp. 80848


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.