Low-temperature migration of hydrogen and interaction with oxygen

Materials Science Forum

Volumn 258-263, Issue PART 1, 1997, Pages 271-276

  Bonde Nielsen, K ^a   Bech Nielsen, B ^a   Hansen, J ^a  

^a AARHUS UNIVERSITY   (Denmark)

Author keywords

Diffusion; Hydrogen; Ion implantation; Oxygen; Silicon

Indexed keywords

ANNEALING; CHEMICAL BONDS; CRYSTAL DEFECTS; DEEP LEVEL TRANSIENT SPECTROSCOPY; DIFFUSION IN SOLIDS; ELECTRON EMISSION; ENERGY GAP; ION IMPLANTATION; LOW TEMPERATURE PHENOMENA; OXYGEN; PROTONS; SEMICONDUCTING SILICON;

LOW TEMPERATURE MIGRATION;

HYDROGEN;

EID: 0542381151     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Article

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