High resolution single-component resists based on terpolymers having photoacid-generating camphorsulfonyloxymaleimide units

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 489-492

  Kim, Sang Tae ^b   Kim, Jin Baek ^b   Kim, Jong Man ^a   Chung, Chan Moon ^a   Ahn, Kwang Duk ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Camphorsulfnyloxymaleimide; Photo acid generation; Terpolymers

Indexed keywords

EID: 0542380891     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.489     Document Type: Article

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