Anisotropic Etching of Polysilicon in a Cl2/CH3Br/O2 Plasma

Journal of the Electrochemical Society

Volumn 148, Issue 8, 2001, Pages

  Yi, Whikun ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0442299785     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1383555     Document Type: Article

References (13)

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