Sub-100 nm focused ion beam lithography using ladder silicone spin-on glass

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3916-3919

  Suzuki, Kohei ^a   Yamashita, Motoji ^a   Kawakami, Nobuyuki ^a   Yoshikawa, Akihisa ^a   Nakaue, Akimitsu ^a  

^a KOBE STEEL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348242538     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588694     Document Type: Article

References (5)

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3. K. Suzuki, M. Yamashita, H. Ueda, and A. Nakaue, Jpn. J. Appl. Phys. 33, 7033 (1994).
4. K. Suzuki, T. Kinoshita, M. Yamashita, N. Kawakami, and A. Nakaue, J. Vac. Sci. Technol. B 13, 2593 (1995).
5. T. Tanaka, M. Morigami, H. Oizumi, T. Soga, T. Ogawa, and F. Murai, J. Electrochem. Soc. 141, 169 (1994).