Size effect of nano-copper films on complex optical constant and permittivity in infrared region

Materials Letters

Volumn 58, Issue 6, 2004, Pages 1117-1120

  Du, H ^a   Lee, S W ^a   Gong, J ^b   Sun, C ^b   Wen, L S ^b  

^a SunMoon University   (South Korea)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Complex optical constant; Complex permittivity; Magnetron sputtering; Nano copper film; Size effect

Indexed keywords

CAPACITANCE; CORRELATION METHODS; DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; LIGHT REFLECTION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PARAMETER ESTIMATION; PERMITTIVITY; THICKNESS MEASUREMENT;

COMPLEX OPTICAL CONSTANT; COMPLEX PERMITTIVITY; NANO-COPPER FILMS; SIZE EFFECT;

METALLIC FILMS;

EID: 0348231751     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2003.09.002     Document Type: Article

References (19)

1. Tang Z.L., Huang R.F., Wen L.S. Acta Metall. Sin. 32:1996;308.
2. Cao X.H., Tang Z.L., Huang R.F., Wen L.S. Acta Metall. Sin. 32:1996;405.
3. Tang Z.L., Huang R.F., Wen L.S. Chin. J. Mater. Res. 11:1997;438.
4. Bobrov Y., Novak V. Mol. Mater. 14:2001;21.
5. Sung L.-P., Nadal M.E., Mcknight M.E., Marx-Brentlaurenti E. J. Coat. Technol. 74:2002;55.
6. Johnson P.B., Christy R.W. Phys. Rev., B. 6:1972;4307.
7. Bobrov Y., Novak V. Mol. Mater. 14:2001;21.
8. Zheng Y., Kikuchi K. Appl. Opt. 36:1997;6325.
9. Siqneiros J.M., Regalado L.E., Machorro R. Appl. Opt. 27:1988;4260.
10. Müllerová J., Mudroň J. Acta Phys. Slovaca. 50:2000;477.
11. Swanepoel R. J. Phys. E. 16:1983;1214.
12. Bueno R.M., Trigo J.F., Mattinez-Duart J.M., Elizalous E., Sanz J.M. J. Vac. Sci. Technol., A. 13:1995;2378.
13. Nguyen H.V., An H., Collins R.W. Phys. Rev. Lett. 68:1992;994.
14. Harris L., Loeb A.L. J. Opt. Soc. Am. 45:1955;179.
15. Granqvist C.G., Hunderi O. Phys. Rev., B. 16:1977;3513.
16. Mantese J.V., Curtin W.A., Webb W.W. Phys. Rev., B. 33:1986;7897.
17. Yang S.H., Prabold D.A., Adams J.B., Ordejón P., Glassford K. J. Phys., Condens. Matter. 9:1997;139.
18. Wasa K., Hayakawa S. Handbook of Sputter Deposition Technology. 1992;10-17 Noyes Publications, Park Ridge, NJ, USA.
19. Xie T.S., Du H., Meng X.M., Sun C., Wen L.S. Acta Metall. Sin. 37:2001;113.