Structural and dielectric properties of mesoporous silsesquioxane films

Chemical Physics Letters

Volumn 384, Issue 1-3, 2004, Pages 63-67

  Yu, Suzhu ^a   Wong, Terence K S ^a   Hu, Xiao ^b   Pita, Kantisara ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMIDE; HYDROGEN; HYDROGEN METHYLSILSESQUIOXANE; METHYL GROUP; NITROGEN; POLYAMINE; POLYMER; SILOXANE; UNCLASSIFIED DRUG;

AIR; ARTICLE; ATMOSPHERIC RADIOACTIVITY; BINDING AFFINITY; CONCENTRATION RESPONSE; COVALENT BOND; DECOMPOSITION; DIELECTRIC CONSTANT; FILM; INTERMETHOD COMPARISON; MOLECULAR DYNAMICS; PHOTODEGRADATION; POROSITY; STRUCTURE ANALYSIS; SURFACE PROPERTY; SYNTHESIS;

EID: 0348230651     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2003.12.004     Document Type: Article

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